Nano-CMOS Gate Dielectric Engineering

This Book is a systematic review of high-K gate dielectric materials for CMOS chips (complementary metaloxide semiconductors), which are used in Image sensors and data convertors (amplifiers, digital Camera sensors, etc). Scaling CMOS Devices down to the nanoscale creates new materials challenges, and one effective response is to introduce Novel materials such as High K dielectrics. The book presents the fundamental Physics and properties of High-K materials and how they can be fabricated and used in Nano CMOS devices.

The Chinese University of Hong KongIi Electronics from the Chinese University of Hong Kong and a Ph. D. in Electrical and electronic Engineering from the University of Hong Kong. Dr. Wong joined the faculty of the Department of Electronic Engineering at City University of Hong Kong in 1989 and is currently a full professor of the Department. He was a visiting professor for the 21 Century Centre of Excellent (COE21) for Photonics-Nanodevice Integration Engineering, Tokyo Institute of Technology, Japan. Dr. Wong was the chair for the Ieee ED/SSC Hong Kong Joint Chapter during 2002-2003. He is a member of the international steering committees, technical Program committees, and organizing committees for many international and local conferences.