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Physics and Technology of High-K Gate Dielectrics Ii Proceedings of the Second International Symposium On High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues : Held in Orlando, Florida, October 12-16, 2003

 
Physics and Technology of High-K Gate Dielectrics Ii Proceedings of the Second International Symposium On High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues : Held in Orlando, Florida, October 12-16, 2003,1566774055,9781566774055

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Book Information

Publisher:Electrochemical Society
Published In:2004
ISBN-10:1566774055
ISBN-13:9781566774055
Pages:pp. xvii + 490, Illus.

The Title "Physics and Technology of High-K Gate Dielectrics Ii Proceedings of the Second International Symposium On High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues : Held in Orlando, Florida, October 12-16, 2003" was published in the year 2004. This book has total of pp. xvii + 490 (Pages). The publisher of this title is Electrochemical Society. Physics and Technology of High-K Gate Dielectrics Ii Proceedings of the Second International Symposium On High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues : Held in Orlando, Florida, October 12-16, 2003 is currently Not Available with us.You can enquire about this book and we will let you know the availability.